UMF-Cleanroom (UMF-Cleanroom)
The Cleanroom occupies a floor area of 600 square meters including plant room, gas room and staff office. The plant room and gas room are equipped with facilities to support the operation of the cleanroom. The cleanroom provides class 100, class 1,000 and class 10,000 environments (ISO 5, 6 and 7 respectively).
Class 100 room is a yellow room, which is designed for doing photolithography. Photolithography is a process to transfer a mask pattern on to the substrate, such as silicon wafer. The pitch of the pattern can be as small as a few tens of micrometer, so photolithography should be performed in a particle free environment.
Device fabrication and measurement would be performed in class 1,000 and class 10,000 environment. Equipment includes thin film deposition system, ink-jet printing system, plasma etcher, wire bonder, probe station etc. Other facilities have solvent cabinet, chemical cabinet for acid/ base solution and refrigerator.
Alert 1: From 1-Jan 2023, “Note” field in booking must be filled with approved Process Flow code (e.g Processflow-20000000R-221022-01). Booking with NO approved Process Flow code may be cancelled without noticed! For detail, please refer to Frequently Asked Question at below.
Alert 2: For safety reason required by CFSO, user would stay after 11:00 pm needs to register at security unit in advance everytime. User should obtain your supervisor approval and forward the approval and other information (Full name, Contact telephone number, Laboratory of stay, Duration of stay) to laboratory persons-in-charge by email. Security staff may ask you to leave immediately if no registration in advance.
Charging Scheme:
- Introduction of Cleanroom and Safety (compulsory): HK$150/user (internal); HK$180/user (Others)
- Lab access (internal: HK$50/user/day) + material cost + equipment cost
Useful Information:
- Cleanroom Introduction and Safety Video (all users should have a look)
- Frequently Asked Question (equipment training, booking, Process Flow, etc.)
- Submit Cleanroom Online Equipment Training Records
- Sample of Process Flow
User can enter cleanroom 30 minutes before the start of booking session. However it will take no more than 10 minutes to activate cleanroom door access, after the booking session is created.
Upcoming Training Session:
Training Session for DektakXT Surface Profiler
- Training Session will be held on 19 Apr at 10:30 am. Please click here to enroll. (P.S. Gather at Room HJ709)
Instruments
- Access Only 1
- Access Only 2
- Access Only 3
- Access Only 4
- Access Only 5
- Aixtron BM Pro 4 PECVD
- Atomic Layer Deposition System
- Bruker DektakXT Surface Profiler
- Denton E-beam Deposition System
- Denton Sputtering System
- Denton Thermal Evaporator
- EZ Imprinting PL400 Nano-imprinter
- F&K Delvotec 5630 Semi-automatic Wire Bonder System
- Harrick Plasma Cleaner
- Hitachi TM3000 Desk-top SEM
- Inductively Coupled Plasma (ICP) Etcher
- Leica DM2700 Optical Microscopy (Yellow Room) [Photolithography Use ONLY]
- Martin Christ Freeze Dryer
- neaSNOM Scattering-type scanning near-field optical microscope
- Novascan UV Ozone
- OAI MBA800 Mask Aligner
- PixDro LP50 Ink-jet Printer
- Probe Station with Semiconductor Parameter Analyzer
- PVA TePla IoN Radical Plasma Cleaner
- Rapid Thermal Processor
- Sawatec HMDS Hotplate HP-200
- Sawatec SM-180-BT Easy Spin Coater
- Sawatec Spin Coater (Photoresist Only)
- SUSS MA6 Mask Aligner
- Wet Station for Acid/ Base
- Wet Station for Cleaning (Yellow Room)